Nova Crystal Technologies LimitedNOVA CRYSTALTECHNOLOGIES LIMITED
QD · Electronic Grade Diamond

Electronic Grade
Diamond

Ultra-high-purity, low-stress single-crystal diamond engineered as a clean host for single-NV research, controlled defect creation and quantum-device fabrication.

N < 5 ppbNV < 0.03 ppb{100}/{110}/{111}Ra < 1 nmCVD / HPHT
Ultra-high-purity low-stress electronic-grade single-crystal diamond substrates
Ultra-high purityNitrogen < 5 ppb for a low-background host.
Low internal stressHigh crystal quality for optical and spin experiments.
Multiple orientations{100}, {110} and {111} available.
Ultra-fine surfaceRa < 1 nm for downstream processing.
Why Electronic Grade

A cleaner host gives you
more control over the defect.

Electronic-grade diamond minimizes unwanted nitrogen and native NV background before implantation, irradiation or other defect-engineering steps.

High-purity host crystal

Start from the diamond, not from the background.

For single-NV experiments and engineered defects, the host crystal should contribute as little unwanted spin and optical background as possible.

LOW STRESS · HIGH CRYSTAL QUALITY
N < 5 ppb
Low nitrogen background

Suitable as a starting substrate for controlled NV creation and low-background quantum measurements.

NV < 0.03 ppb
Low native NV background

Helps distinguish deliberately engineered defects from pre-existing NV centers.

Ra < 1 nm
Precision polished surface

Prepared for implantation, lithography, surface engineering and optical experiments.

{100}/{110}/{111}
Orientation control

Select crystallographic orientation around NV alignment, optical geometry and device design.

Platform Role

The starting material for
NV engineering.

Electronic-grade diamond is not the end architecture. It is the controlled host on which shallow NV, arrays, isotope-defined layers and other quantum structures can be built.

01 · CONTROL

Single-NV Research

Low-background host material for locating and studying isolated color centers.

02 · ENGINEER

Ion Implantation

Clean starting substrate for controlled ¹⁴N/¹⁵N implantation, depth engineering and patterned defect creation.

03 · INTEGRATE

Quantum Devices

Precision-polished diamond for photonics, sensing structures and heterogeneous device integration.

Typical Specifications

Configure the host crystal.

Standard electronic-grade material is available in multiple orientations and dimensions, with custom processing according to the experiment.

Electronic gradeCustomizable
Growth method
CVD / HPHT
Nitrogen concentration
N < 5 ppb
Native NV concentration
NV < 0.03 ppb
¹³C abundance
1.1% natural abundance; isotope engineering available separately
Crystal orientation
{100} / {110} / {111}
Typical lateral sizes
2 / 3 / 4 / 5 / 10 mm; custom
Typical thickness
0.1–0.5 mm; custom processing available
Surface roughness
Ra < 1 nm*
Surface finish
Precision polished; single- or double-side options by project
Surface termination
Hydrogen / Oxygen available by project
* Final surface roughness and processing specification depend on orientation, dimensions and project requirements and are confirmed per quotation.
Applications

A high-purity foundation
for quantum experiments.

Use electronic-grade diamond when the experiment requires a controlled host before defect creation or device fabrication.

01

Single-NV Studies

Low-background material for isolated color-center spectroscopy and spin experiments.

02

Controlled Implantation

Starting substrate for shallow NV, ¹⁴N/¹⁵N implantation, arrays and clusters.

03

Quantum Photonics

High-quality single crystal for optical structures, waveguides and photonic-device research.

04

Device Integration

Precision-polished diamond for sensing chips, hybrid structures and downstream fabrication.

Custom Processing

Start with the host,
then build the architecture.

Nova can combine electronic-grade substrates with orientation control, precision polishing, implantation, NV formation and surface preparation.

01Select hostCVD or HPHT, size and orientation.
02Precision processThickness, cutting and Ra < 1 nm polishing.
03Engineer defectsImplantation species, depth, dose or pattern.
04Form NV centersPost-implantation processing and annealing.
05Finish & verifyH/O termination and requested characterization.

Need a specific electronic-grade substrate?

Send the required size, thickness, orientation, surface finish and downstream experiment. We can translate it into a material specification.

Discuss Your Experiment →