Nova Crystal Technologies LimitedNOVA CRYSTALTECHNOLOGIES LIMITED
QNV-2D · Shallow NV Engineering

Shallow NV
Diamond

Near-surface NV centers engineered within 5–100 nm of the diamond surface for strong coupling to external spins, nanoscale magnetic sensing and surface-sensitive NMR.

5–100 nm¹⁴N / ¹⁵N{100}/{110}/{111}Ra < 1 nmH / O termination
3D shallow NV diamond showing surface spins, magnetic coupling, a near-surface NV center and 5–100 nm engineered depth
Why Shallow Matters

Bring the NV sensor
closer to the signal.

For surface-sensitive experiments, NV depth directly affects coupling to spins and fields outside the diamond. The objective is not simply “as shallow as possible”, but the right depth with usable spin performance and a controlled surface.

depthEXTERNAL / SURFACE SPINSSHALLOW NV

Depth sets the sensing distance.

Near-surface NV centers can interact with magnetic moments and spin ensembles outside the diamond, making them suitable for nanoscale sensing and surface-sensitive spectroscopy.

shallower NV → stronger near-field coupling
surface quality + spin coherence still matter
01
Depth engineeringTarget 5–100 nm according to sensing distance and experimental geometry.
02
Low-background hostElectronic-grade diamond minimizes unwanted nitrogen and defect background.
03
Surface engineeringHydrogen or oxygen termination can be selected around the near-surface experiment.
Depth Engineering Window

5–100 nm is a platform,
not one fixed recipe.

Implantation species, energy, dose, crystal orientation, annealing and surface preparation are selected around the target NV architecture.

Near-surface architecture
5 nm10 nm30 nm70 nm100 nm
ULTRA-SHALLOW / SURFACE SENSING
DEPTH TAILORED TO EXPERIMENT
Engineering variables

Depth is only one variable.

The shallow-NV architecture is defined together with the host crystal and surface.

DEPTH5–100 nm
IMPLANTED ION¹⁴N⁺ / ¹⁵N⁺
ORIENTATION{100} / {110} / {111}
DOSEsingle → ensemble
SURFACEH / O termination
ROUGHNESSRa < 1 nm*
Typical Specifications

Configure the shallow-NV layer.

These values define the normal engineering window. Final implantation and processing parameters should be selected around the measurement requirement.

QNV-2DCustomizable
Host material
Electronic-grade single-crystal diamond
NV depth
5–100 nm
Typical depth targets
5 / 10 / 20 / 30 / 70 nm; custom
Implanted ion
¹⁴N⁺ / ¹⁵N⁺
Implantation energy
2–50 keV typical engineering range
Implantation dose
10⁹–10¹⁴ ions/cm², architecture dependent
Crystal orientation
{100} / {110} / {111}
Typical substrate sizes
2×2 / 4×4 / 5×5 mm; custom
Surface roughness
Ra < 1 nm*
Surface termination
Hydrogen / Oxygen; custom preparation
* Surface roughness specification depends on substrate type, orientation and processing route. Final values are confirmed per quotation.
Surface Engineering

The surface is part
of the quantum device.

When the NV center is only nanometers below the surface, surface chemistry can influence charge stability, noise and device integration. Nova can prepare H- or O-terminated surfaces according to project requirements.

H termination

Hydrogen-Terminated Surface

Available for experiments or device structures where hydrogen surface chemistry is required. Surface preparation is coordinated with the NV depth and downstream device process.

HHH
O termination

Oxygen-Terminated Surface

Available for near-surface sensing workflows requiring an oxygen-terminated interface, with polishing and cleaning coordinated to the final surface condition.

OOO
Applications

Built for surface-sensitive
quantum measurements.

Shallow NV centers are most useful when the signal source sits outside or immediately above the diamond surface.

01

Nanoscale Magnetic Sensing

Detect localized magnetic fields and magnetic textures with a near-surface spin sensor.

02

Nanoscale NMR / MRI

Surface-sensitive detection of nuclear spins in small sample volumes and molecular systems.

03

Scanning NV Probes

Shallow NV architectures for high-spatial-resolution scanning quantum sensing platforms.

04

Surface & 2D Materials

Study magnetic and spin phenomena in thin films, interfaces and two-dimensional materials.

From Experiment to Sample

Specify the sensing problem,
then engineer the diamond.

Nova supports the workflow from substrate selection through implantation, NV formation, surface preparation and characterization.

01Define targetSensing distance, sample geometry and expected signal.
02Select hostElectronic-grade substrate, size and orientation.
03Design implant¹⁴N/¹⁵N, energy, dose and spatial architecture.
04Form NV centersPost-implantation processing and annealing.
05Finish & verifyH/O surface preparation and requested spin/optical characterization.

Tell us the sensing depth you need.

Send the target depth, orientation, isotope, dose or application. We can translate it into a shallow-NV material specification.

Discuss Your Experiment →